Process Optimization / Electron Beam Lithography / Surface Roughness / Plasma Etching / Room Temperature / Three Dimensional / D structure / Electrical And Electronic Engineering / Three Dimensional / D structure / Electrical And Electronic Engineering
Process Optimization / Electron Beam Lithography / Surface Roughness / Plasma Etching / Room Temperature / Three Dimensional / D structure / Electrical And Electronic Engineering / Three Dimensional / D structure / Electrical And Electronic Engineering
Engineering / Electron Beam Lithography / Magnetic thin film / Magnetic Force Microscopy / Low Frequency / Magnetic field / High Frequency / Physical sciences / Oscillations / Magnetic Domains / Dynamic Response / Dynamic Properties / Magnetic field / High Frequency / Physical sciences / Oscillations / Magnetic Domains / Dynamic Response / Dynamic Properties
Engineering / Electron Beam Lithography / Magnetic thin film / Magnetic Force Microscopy / Low Frequency / Magnetic field / Quantum Dots / High Frequency / Physical sciences / Oscillations / Magnetic Domains / Dynamic Response / Vortices / Dynamic Properties / Magnetic resonance image / Magnetic field / Quantum Dots / High Frequency / Physical sciences / Oscillations / Magnetic Domains / Dynamic Response / Vortices / Dynamic Properties / Magnetic resonance image
